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<article xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" article-type="research-article" dtd-version="1.3" xml:lang="en">
  <front>
    <journal-meta>
      <journal-id journal-id-type="publisher-id">research-focus</journal-id>
      <journal-title-group>
        <journal-title>Research Focus International Scientific Journal</journal-title>
        <abbrev-journal-title abbrev-type="publisher">Research Focus</abbrev-journal-title>
      </journal-title-group>
      <issn pub-type="epub" publication-format="electronic">2181-3833</issn>
      <publisher>
        <publisher-name>Ilm-fan va innovatsiyalar akademiyasi</publisher-name>
      </publisher>
    </journal-meta>
    <article-meta>
      <article-id pub-id-type="doi">10.66073/researchfocus.v4i11.1823</article-id>
      <article-id pub-id-type="other" assigning-authority="relibrary.uz">REL-A-013139</article-id>
      <article-categories>
        <subj-group subj-group-type="oak">
          <subject>01.00.00</subject>
        </subj-group>
      </article-categories>
      <title-group>
        <article-title xml:lang="en">FTIR SPECTRUM ANALYSIS OF SILICON DOPED WITH ERBIUM</article-title>
        <trans-title-group xml:lang="ru">
          <trans-title>АНАЛИЗ ИК-ФУРЬЕ СПЕКТРА КРЕМНИЯ, ЛЕГИРОВАННОГО ЭРБИЕМ</trans-title>
        </trans-title-group>
        <trans-title-group xml:lang="uz">
          <trans-title>ERBIY BILAN LEGIRLANGAN KREMNIYNING FTIR SPEKTRI TAHLILI</trans-title>
        </trans-title-group>
      </title-group>
      <contrib-group content-type="author">
        <contrib contrib-type="author">
          <string-name>Sharifa B</string-name>
          <aff>Institute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan, Tashkent, Uzbekistan</aff>
        </contrib>
        <contrib contrib-type="author">
          <string-name>Utamuradova, Jonibek J. Khamdamov, Bekzod Sh. Alikulov</string-name>
          <aff>Institute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan, Tashkent, Uzbekistan</aff>
        </contrib>
        <contrib contrib-type="author">
          <string-name>Khojakbar S. Daliyev</string-name>
          <aff>Branch of the Federal State Budgetary Educational Institution of Higher Education &quot;National Research University MPEI&quot;,Tashkent, Uzbekistan</aff>
        </contrib>
      </contrib-group>
      <pub-date publication-format="electronic" date-type="pub" iso-8601-date="2025-12-05">
        <day>05</day>
        <month>12</month>
        <year>2025</year>
      </pub-date>
      <pub-date date-type="collection">
        <year>2025</year>
      </pub-date>
      <volume>4</volume>
      <issue>11</issue>
      <fpage>8</fpage>
      <lpage>15</lpage>
      <permissions>
        <license xlink:href="https://creativecommons.org/licenses/by/4.0">
          <ali:license_ref>https://creativecommons.org/licenses/by/4.0</ali:license_ref>
          <license-p>This work is licensed under a Creative Commons Attribution 4.0 International License.</license-p>
        </license>
      </permissions>
      <self-uri xlink:href="https://relibrary.uz/REL-A-013139/"/>
      <abstract xml:lang="en">
        <p>Semiconductor materials based silicon are a key component of modern microelectronics and optoelectronics. In particular, when Erbium (Er) is introduced into the crystal lattice, a number of important structural changes occur in the silicon structure. In silicon, such changes are particularly well detected by infrared (FTIR) spectroscopy, since this method can accurately record the vibrational modes of bonds such as Si–O–Si, Er–O, Si–C, etc. The formation of new phases in the structure, the degree of oxidation, and the concentration of optically active oxygen are estimated by the location, intensity, and width of the peaks obtained using FTIR. The most important changes were noted around the Si–O–Si assymmetric stretching vibration (νₐs) line. While this peak was detected at 1099 cm-¹ in the sample with erbium atoms introduced, in the original sample it shifted to 1109 cm-¹, its intensity also decreased, and the line broadened. These changes are explained by the formation of an oxygen-enriched but highly disordered amorphous SiOₓ layer during thermal treatment. As a result, the angle in the Si–O–Si bonds widens, the bond length increases slightly, which leads to a decrease in the vibrational frequency, along with a decrease in bond elasticity. The broadening of the peak indicates an increase in the angle and bond length distribution in the structure.</p>
      </abstract>
      <trans-abstract xml:lang="ru">
        <p>Полупроводниковые материалы на основе кремния являются ключевым компонентом современной микроэлектроники и оптоэлектроники. В частности, при введении эрбия (Er) в кристаллическую решетку происходит ряд важных структурных изменений в структуре кремния. В кремнии такие изменения особенно хорошо обнаруживаются с помощью инфракрасной (ИК) спектроскопии, поскольку этот метод позволяет точно регистрировать колебательные моды связей, таких как Si–O–Si, Er–O, Si–C и т. д. Образование новых фаз в структуре, степень окисления и концентрация оптически активного кислорода оцениваются по положению, интенсивности и ширине пиков, полученных с помощью FTIR. Наиболее важные изменения были отмечены вокруг линии асимметричного валентного колебания Si–O–Si (νₐs). В то время как этот пик был обнаружен при 1099 см⁻¹ в образце с введенными атомами эрбия, в исходном образце он сместился до 1109 см⁻¹, его интенсивность также уменьшилась, а линия расширилась. Эти изменения объясняются образованием обогащенного кислородом, но сильно разупорядоченного аморфного слоя SiOₓ в процессе термической обработки. В результате угол в связях Si–O–Si увеличивается, длина связи несколько увеличивается, что приводит к снижению частоты колебаний наряду с уменьшением эластичности связи. Уширение пика указывает на увеличение распределения углов и длин связей в структуре.</p>
      </trans-abstract>
      <trans-abstract xml:lang="uz">
        <p>Kremniy asosidagi yarimo‘tkazgich materiallar zamonaviy mikroelektronika va optoelektronikaning muhim tarkibiy qismi hisoblanadi. Xususan, kristall panjaraga erbiy (Er) kiritilganda kremniy tuzilishida bir qator muhim strukturaviy o‘zgarishlar sodir bo‘ladi. Kremniyda bunday o‘zgarishlar infraqizil (FTIR) spektroskopiya yordamida ayniqsa yaxshi aniqlanadi, chunki bu usul Si–O–Si, Er–O, Si–C kabi bog‘lanishlarning tebranish modalarini aniq qayd etish imkonini beradi. Tuzilishda yangi fazalarning hosil bo‘lishi, oksidlanish darajasi va optik faol kislorod konsentratsiyasi FTIR yordamida olingan cho‘qqilarning joylashuvi, intensivligi va kengligi bo‘yicha baholanadi. Eng muhim o‘zgarishlar Si–O–Si assimetrik valent tebranishi (νₐs) chizig‘i atrofida qayd etildi. Erbiy atomlari kiritilgan namunada bu cho‘qqi 1099 sm⁻¹ da aniqlangan bo‘lsa, dastlabki namunada u 1109 sm⁻¹ ga siljigan, intensivligi ham kamaygan va chiziq kengaygan. Bu o‘zgarishlar termik ishlov berish jarayonida kislorodga boyigan, biroq kuchli tartibsizlangan amorf SiOₓ qatlamining hosil bo‘lishi bilan izohlanadi. Natijada Si–O–Si bog‘lanishlaridagi burchak kengayadi, bog‘lanish uzunligi biroz ortadi, bu esa bog‘lanish elastikligining kamayishi bilan birga tebranish chastotasining pasayishiga olib keladi. Cho‘qqining kengayishi tuzilishdagi burchak va bog‘lanish uzunligi taqsimotining ortishidan dalolat beradi.</p>
      </trans-abstract>
      <kwd-group xml:lang="en">
        <kwd>monocrystalline silicon (n-Si)</kwd>
        <kwd>erbium</kwd>
        <kwd>rare earth element</kwd>
        <kwd>heat treatment</kwd>
        <kwd>FTIR spectrometer</kwd>
        <kwd>diffusion</kwd>
      </kwd-group>
      <kwd-group xml:lang="ru">
        <kwd>монокристаллический кремний (n-Si)</kwd>
        <kwd>эрбий</kwd>
        <kwd>редкоземельный элемент</kwd>
        <kwd>термическая обработка</kwd>
        <kwd>FTIR-спектрометр</kwd>
        <kwd>диффузия</kwd>
      </kwd-group>
      <kwd-group xml:lang="uz">
        <kwd>monokristall kremniy (n-Si)</kwd>
        <kwd>erbiy</kwd>
        <kwd>noyob yer elementi</kwd>
        <kwd>termik ishlov berish</kwd>
        <kwd>FTIR spektrometr</kwd>
        <kwd>diffuziya</kwd>
      </kwd-group>
    </article-meta>
  </front>
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