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  <front>
    <journal-meta>
      <journal-id journal-id-type="publisher-id">research-focus</journal-id>
      <journal-title-group>
        <journal-title>Research Focus International Scientific Journal</journal-title>
        <abbrev-journal-title abbrev-type="publisher">Research Focus</abbrev-journal-title>
      </journal-title-group>
      <issn pub-type="epub" publication-format="electronic">2181-3833</issn>
      <publisher>
        <publisher-name>Ilm-fan va innovatsiyalar akademiyasi</publisher-name>
      </publisher>
    </journal-meta>
    <article-meta>
      <article-id pub-id-type="doi">10.66073/researchfocus.v3i3.919</article-id>
      <article-id pub-id-type="other" assigning-authority="relibrary.uz">REL-A-012506</article-id>
      <article-categories>
        <subj-group subj-group-type="oak">
          <subject>01.00.00</subject>
        </subj-group>
      </article-categories>
      <title-group>
        <article-title xml:lang="en">DOPING A SILICON SINGLE CRYSTAL WITH TERBIUM THROUGH DIFFUSION.</article-title>
        <trans-title-group xml:lang="ru">
          <trans-title>ЛЕГИРОВАНИЕ МОНОКРИСТАЛЛА КРЕМНИЯ ТЕРБИЕМ МЕТОДОМ ДИФФУЗИИ.</trans-title>
        </trans-title-group>
        <trans-title-group xml:lang="uz">
          <trans-title>KREMNIY MONOKRISTALLINI TERBIY BILAN DIFFUZIYA YO‘LI ORQALI LEGIRLASH.</trans-title>
        </trans-title-group>
      </title-group>
      <contrib-group content-type="author">
        <contrib contrib-type="author">
          <string-name>Saidimov Ya.A.</string-name>
          <aff>Research Institute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan (Tashkent), Uzbekistan</aff>
        </contrib>
        <contrib contrib-type="author">
          <string-name>Rumi R.F.</string-name>
          <aff>Research Institute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan (Tashkent), Uzbekistan</aff>
        </contrib>
        <contrib contrib-type="author">
          <string-name>Umarov F.B.</string-name>
          <aff>Research Institute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan (Tashkent), Uzbekistan</aff>
        </contrib>
      </contrib-group>
      <pub-date publication-format="electronic" date-type="pub" iso-8601-date="2024-04-05">
        <day>05</day>
        <month>04</month>
        <year>2024</year>
      </pub-date>
      <pub-date date-type="collection">
        <year>2024</year>
      </pub-date>
      <volume>3</volume>
      <issue>3</issue>
      <fpage>8</fpage>
      <lpage>10</lpage>
      <permissions>
        <license xlink:href="https://creativecommons.org/licenses/by/4.0">
          <ali:license_ref>https://creativecommons.org/licenses/by/4.0</ali:license_ref>
          <license-p>This work is licensed under a Creative Commons Attribution 4.0 International License.</license-p>
        </license>
      </permissions>
      <self-uri xlink:href="https://relibrary.uz/REL-A-012506/"/>
      <abstract xml:lang="en">
        <p>Using the diffusion method, monocrystalline samples of silicon doped with Thulium were prepared at 1250 degrees Celsius for 50 hours. The samples were found to have p-type conductivity after high-temperature annealing. After this process, the samples changed their type of conductivity from p-type to n-type.</p>
      </abstract>
      <trans-abstract xml:lang="ru">
        <p>Методом диффузии при температуре 1250 градусов Цельсия в течение 50 часов были получены монокристаллические образцы кремния, легированные тулием. Установлено, что после высокотемпературного отжига образцы обладают проводимостью p-типа. После этого процесса образцы изменили тип проводимости с p-типа на n-тип.</p>
      </trans-abstract>
      <trans-abstract xml:lang="uz">
        <p>Diffuziya usuli yordamida 1250 daraja Selsiy haroratda 50 soat davomida tuliy bilan legirlangan kremniyning monokristall namunalari tayyorlandi. Yuqori haroratli tavlashdan keyin namunalar p-tipli o‘tkazuvchanlikka ega ekanligi aniqlandi. Ushbu jarayondan so‘ng namunalar o‘tkazuvchanlik turini p-tipdan n-tipga o‘zgartirdi.</p>
      </trans-abstract>
      <kwd-group xml:lang="en">
        <kwd>monocrystalline silicon</kwd>
        <kwd>rare-earth elements</kwd>
        <kwd>Terbium</kwd>
        <kwd>diffusion method</kwd>
        <kwd>alloying</kwd>
        <kwd>Hall effect</kwd>
        <kwd>Van der Pau method</kwd>
        <kwd>type of conductivity</kwd>
        <kwd>concentration of charge carriers</kwd>
        <kwd>resistivity</kwd>
      </kwd-group>
      <kwd-group xml:lang="ru">
        <kwd>монокристаллический кремний</kwd>
        <kwd>редкоземельные элементы</kwd>
        <kwd>тербий</kwd>
        <kwd>метод диффузии</kwd>
        <kwd>легирование</kwd>
        <kwd>эффект Холла</kwd>
        <kwd>метод Ван дер Пау</kwd>
        <kwd>тип проводимости</kwd>
        <kwd>концентрация носителей заряда</kwd>
        <kwd>удельное сопротивление</kwd>
      </kwd-group>
      <kwd-group xml:lang="uz">
        <kwd>monokristall kremniy</kwd>
        <kwd>noyob yer elementlari</kwd>
        <kwd>Terbiy</kwd>
        <kwd>diffuziya usuli</kwd>
        <kwd>legirlash</kwd>
        <kwd>Xoll effekti</kwd>
        <kwd>Van der Pau usuli</kwd>
        <kwd>o‘tkazuvchanlik turi</kwd>
        <kwd>zaryad tashuvchilar konsentratsiyasi</kwd>
        <kwd>solishtirma qarshilik</kwd>
      </kwd-group>
    </article-meta>
  </front>
  <back>
    <ref-list>
      <ref id="r1">
        <label>1</label>
        <mixed-citation>Antonenko R.S., Karpov Yu.A., Shakhovtsov V.I., Shindich V.L., Spinar L.I., Yaskovets I.I. Electrophysical properties of irradiated p-Si with gadolinium admixture. – FTP, 1978, vol. 12, v. 9, pp. 1707-1713.</mixed-citation>
      </ref>
      <ref id="r2">
        <label>2</label>
        <mixed-citation>Shindich V.L. Investigation of the processes of radiation defect formation in silicon doped with rare earth elements. – Author&apos;s thesis. cand. dis. Kiev, 1982. 20 p .</mixed-citation>
      </ref>
      <ref id="r3">
        <label>3</label>
        <mixed-citation>Yu. A. Karpov, V. V. Mazurenko, V. V. Petrov, V. S. Prosolovich, V. D. Tkachev, On the interaction of atoms of rare earth elements with oxygen in silicon, Physics and Technology of semiconductors, 1984, volume 18, issue 2, 368-369</mixed-citation>
      </ref>
      <ref id="r4">
        <label>4</label>
        <mixed-citation>Latukhina N.V., Lebedev V.M. Diffusion alloying of silicon with rare earth elements. Materials of electronic technology. No. 1. Materials science and technology. Semiconductors. 2011. 7-12 p.</mixed-citation>
      </ref>
      <ref id="r5">
        <label>5</label>
        <mixed-citation>Alexandrov O.V., Yemtsev V.V., Poloskin D.S., Sobolev N.A., Shek E.I. Small acceptor centers formed during diffusion of erbium into silicon. FTP. -1994. - Vol.28, issue 11. -pp. 2045-2048.</mixed-citation>
      </ref>
      <ref id="r6">
        <label>6</label>
        <mixed-citation>Zainabiddinov S., Nazirov D.E., Akbarov A.Zh., Iminov A.A., Toshtemirov T.M. Diffusion of erbium into silicon. Letters to ZhTF. -1998. -Vol.24. No.2. -pp. 68-71. <pub-id pub-id-type="doi">10.1134/1.1261999</pub-id></mixed-citation>
      </ref>
      <ref id="r7">
        <label>7</label>
        <mixed-citation>D. E. Nazirov, G. S. Kulikov, R. S. Malkovich, Diffusion of erbium and thulium in silicon, Physics and Technology of Semiconductors, 1991, volume 25, issue 9, 1653-1654</mixed-citation>
      </ref>
      <ref id="r8">
        <label>8</label>
        <mixed-citation>Diffusion of terbium in silicon. Nazirov D.E. //FTP. 2006. Vol.40. V.6. pp. 650-651. <pub-id pub-id-type="doi">10.1134/s1063782606060029</pub-id></mixed-citation>
      </ref>
      <ref id="r9">
        <label>9</label>
        <mixed-citation>Fistul V.I. Introduction to semiconductor physics. Studies. A manual for universities. -2nd ed. – M.: Higher School, 1984. pp. 34-45. <pub-id pub-id-type="doi">10.1007/978-3-662-02445-4_3</pub-id></mixed-citation>
      </ref>
    </ref-list>
  </back>
</article>
